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Technical Publications

Thin Film Products

2008 - A Noval Method for Pushing the Limits of Line Edge Roughness by Scatterometry

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Published at SPIE Advanced Lithography, San Jose, CA, February 2008
Authors:
Yoel Cohen, David Scheiner - Nova Measuring Instruments Ltd.
Barak Yaakobovitz, Yoed Tsur - Technion, Israel Institute of Technology, Dept.of Chemical Engineering

2007 - Plasma-Assisted CD Shrink and Overlay Metrology Techniques

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Authors:
Reza Sadjadi, Helen Zhu, Peter Cirigliano, Elizabeth Pavel, Amulya Athayde - LAM Research Corporation
Cornel Bozdog, Michael Sendler, Danny Mor - Nova Measuring Instruments Ltd.

2007 - Sidewall Residue Metrology for a Single-Wafer Cleaning Platform

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Authors:
Cornel Bozdog, Michael Sendler - Nova Measuring Instruments Inc.
David S. L. Mui, Jorge Luque, Elizabeth Pavel, Amulya Athayde - Lam Research Corporation

2007 - Metrology Solution for Double Patterning Processing

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Authors:
Cornel Bozdog, Michael Sendler, Danny Mor - Nova Measuring Instruments Inc.
Helen Zhu, Reza Sadjadi, Peter Cirigliano, Elizabeth Pavel - Lam Research Corporation

2006 - Overview of Cu CMP metrology with IM for HVM

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Author:
Alex Shulman, Nova Measuring Instruments Ltd., POB 266, Rehovoth 76100, Israel

2005 - Integrated Metrology for Poly CMP Process Control

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Authors:
Dr Changman Moon and Hovav Gilan - Nova Measuring Instruments

2005 - Integrated Monitoring of Step Height in SRAM Cell for STI CMP

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Authors:
Andy Smith, Chad Kaneshige, Serguei Selifanov - Texas Instruments, Dallas, TX
Naren Yellai, Matt Holden, Sergey Goldman, Eitan Blank, Avron Ger - Nova Measuring Instruments, Sunnyvale, CA

2005 - Dielectric and Copper CMP - Evolution of IPC

Open File

Authors:
Dr. Moshe Finarov, Mr. Avron Ger, Dr. Giora Dishon
Nova Measuring Instruments Ltd., Rehovoth, Israel